APA Style
KESSELS, WILHELMUS MATHIJIS MARIE. (2000).
Remote plasma deposition of hydrogeneted amorphous silicon: plasma processes, film growth, and material properties (1).
Eindhoven:
Eindhoven University of Technology.
Chicago Style
KESSELS, WILHELMUS MATHIJIS MARIE.
Remote plasma deposition of hydrogeneted amorphous silicon: plasma processes, film growth, and material properties.
1
Eindhoven:
Eindhoven University of Technology,
2000.
TXB.
MLA Style
KESSELS, WILHELMUS MATHIJIS MARIE.
Remote plasma deposition of hydrogeneted amorphous silicon: plasma processes, film growth, and material properties.
1
Eindhoven:
Eindhoven University of Technology,
2000.
TXB.
Turabian Style
KESSELS, WILHELMUS MATHIJIS MARIE.
Remote plasma deposition of hydrogeneted amorphous silicon: plasma processes, film growth, and material properties.
1
Eindhoven:
Eindhoven University of Technology,
2000.
TXB.